Field briefing
G03F · Photomechanical production of textured or patterned surfaces
Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor;. Patents classified in CPC G03F, part of Computing, measuring and physics.
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Newest patents in G03F · Photomechanical production of textured or patterned surfaces
39 patents imported from the European Patent Office; newest published 2026-09-29; most active companies: Gigaphoton Inc, Cymer LLC, 极光先进雷射株式会社.
- 能够载置多个光源的基板、光源模块以及曝光装置 CN122846917A, published 2026-09-29
- DEVELOPMENT METHOD FOR PATTERNING METAL OXIDE PHOTORESIST US20260288010A1, published 2026-09-24
- STAGE DEVICE, AND CHARGED PARTICLE BEAM APPARATUS AND OPTICAL INSPECTION APPARATUS INCLUDING SAME EP4811417A2, published 2026-09-23
- RECIPE TRANSFER OF PLASMA PROCESS USING PLASMA PARAMETERS DETERMINED BY VIRTUAL METROLOGY (VM) FEATURE SELECTION US20260277114A1, published 2026-09-17
- 激光腔、气体激光装置和电子器件的制造方法 CN122763132A, published 2026-09-15
- 激光腔室及电子器件的制造方法 CN122763133A, published 2026-09-15
- 激光用腔室装置、激光装置以及电子器件的制造方法 CN122716668A, published 2026-09-08
- MODEL-BASED AUTOMATIC DEFECT CLASSIFICATION DURING WAFER INSPECTION WO2026180159A1, published 2026-09-03
- METHOD FOR FORMING FINE PATTERN AREAS WO2026182192A1, published 2026-09-03
- PHOTOSENSITIVE RESIN COMPOSITION AND CONDUCTIVE ADHESIVE AGENT USING SAME WO2026176908A1, published 2026-08-27
- 一种等离子体超表面及其制备方法 CN122632366A, published 2026-08-25
- 一种用于极紫外激光的激光系统 CN122546569A, published 2026-08-11
- MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, DATA GENERATION APPARATUS, COMPLEXITY CALCULATION APPARATUS, MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND DATA GENERATION METHOD US20260229453A1, published 2026-08-06
- Excimer laser device and method for manufacturing electronic device CN122474964A, published 2026-07-28
- Process environment maintenance method of etching equipment, electronic equipment and readable storage medium CN122455618A, published 2026-07-24
- MULTI-BEAM INSPECTION METHOD WITH PRECISE DEFECT LOCATION WO2026153726A1, published 2026-07-23
- METHOD FOR REMOVING DEFECT US20260211314A1, published 2026-07-23
- METHOD OF CLEANING SENSOR USED IN SEMICONDUCTOR MANUFACTURING TOOL US20260213141A1, published 2026-07-23
- LASER DEVICE AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE CN122436779A, published 2026-07-21
- Verfahren zum Erzeugen und Verstärken von Laserpulsen, Verfahren zum Erzeugen eines eine Sekundärstrahlung emittierenden Plasmas, Verfahren zum Herstellen von Mikrochips oder von Halbleiter-Zwischenprodukten und optische Anordnung DE102025100893A1, published 2026-07-16
- LASER CHAMBER, LASER DEVICE, AND ELECTRONIC DEVICE MANUFACTURING METHOD US20260204859A1, published 2026-07-16
- Optische Anordnung zum Ermitteln einer Strahlkaustik eines Laserstrahls, Verfahren zum Bestimmen einer Strahlkaustik eines Laserstrahls mit einer optischen Anordnung, EUV-Treiberlaser, EUV-Lichterzeugungsanlage und Verfahren zum Herstellen eines Halbleiter-Zwischenprodukts oder eines Mikrochips DE102025101268A1, published 2026-07-16
- Plasmavorrichtung und Verfahren zum Betreiben einer Plasmavorrichtung DE102025100603A1, published 2026-07-09
- BEAM STEERING DEVICE, LASER SYSTEM, BEAM STEERING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD US20260194743A1, published 2026-07-09
- GAS LASER DEVICE AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE CN122348411A, published 2026-07-07
Most active companies
Counted over the newest 39 imported patents in this industry.
- Gigaphoton Inc 8 patents
- Cymer LLC 3 patents
- 极光先进雷射株式会社 3 patents
- Asml Netherlands BV 2 patents
- Canatu OY 2 patents
- Tokyo Electron Ltd 2 patents
- Trumpf Lasersystems FOR Semiconductor Mfg SE 2 patents
- Zeiss Carl SMT GmbH 2 patents
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- B82Y · Specific uses or applications of nanostructures 5 patents in both
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